Glass with a low dielectric constant thickness of about 0.3mm and a pore diameter of 60±5μm
Uses copper plating and VIA filling process
Signals are transmitted from the back to the front via the TGV, supporting transmission speeds exceeding 100GHz

SDD21:184GHz @-3dB |
SCD21:<-20dB @200Ghz |
Compatible with EML lasers
The transmission line step height is 100±5μm, precisely matching the laser intensity
The steps use materials with low dielectric constant and low transmission loss
The process does not involve ceramic sintering or through-hole electroplating
The RF region is isolated from the substrate, ensuring stable performance
The substrate is aluminum nitride
Verified by key clients
